首页> 外国专利> RF RF RF THE APPARATUS OF RF TREATMENT AND THE METHOD OF CONTROLLING TAHT AND THE METHOD OF SKIN TREATMENT USING RF-ENERGY

RF RF RF THE APPARATUS OF RF TREATMENT AND THE METHOD OF CONTROLLING TAHT AND THE METHOD OF SKIN TREATMENT USING RF-ENERGY

机译:射频射频射频治疗仪及其控制方法和利用射频能量进行皮肤治疗的方法

摘要

The present invention relates to an RF treatment device, a control method therefor, and a skin treatment method using RF energy. The RF treatment device comprises: an RF generation unit for generating RF energy; an electrode for transferring the RF energy to a tissue to be treated; a sensor unit for sensing energy transferred to the electrode; and a control unit for controlling an output of the RF generation unit, calculating the impedance of the tissue by receiving a sensing value from the sensor unit, and controlling, if it is determined from the impedance that the tissue to be treated has reached a treatment temperature, power so that the tissue to be treated is maintained at a temperature equal to or below the treatment temperature during a predetermined duration. According to the present invention, the RF treatment device, the control method therefor, and the skin treatment method using RF energy are configured to determine, from the impedance of the tissue to be treated, whether the tissue is at the treatment temperature, and the tissue to be treated may be maintained at the treatment temperature for a predetermined duration while the volume of the tissue to be treated that is at the treatment temperature may be maximized, and thus, accuracy and efficiency of treatment may be increased.
机译:射频治疗设备,其控制方法和使用射频能量的皮肤治疗方法技术领域本发明涉及射频治疗设备,其控制方法和使用射频能量的皮肤治疗方法。该RF治疗设备包括:RF产生单元,用于产生RF能量;以及RF产生单元。用于将RF能量传递到待治疗组织的电极;传感器单元,用于感测传递到电极的能量;控制单元,其控制RF产生单元的输出,通过从传感器单元接收感测值来计算组织的阻抗,并且如果从阻抗中确定要治疗的组织已经达到治疗,则进行控制。温度,功率,以便在预定的持续时间内将要治疗的组织保持在等于或低于治疗温度的温度下。根据本发明,RF治疗装置,其控制方法和使用RF能量的皮肤治疗方法被配置为根据待治疗的组织的阻抗确定组织是否处于治疗温度,并且确定组织是否处于治疗温度。可以将要治疗的组织在治疗温度下保持预定的持续时间,同时可以使处于治疗温度的要治疗的组织的体积最大化,因此可以提高治疗的准确性和效率。

著录项

  • 公开/公告号KR20190112253A

    专利类型

  • 公开/公告日2019-10-04

    原文格式PDF

  • 申请/专利权人 LUTRONIC CORPORATION;

    申请/专利号KR20190116146

  • 发明设计人 KO KWANG CHON;RICHARD HOWARD COHEN;

    申请日2019-09-20

  • 分类号A61N1/40;A61B18;A61B18/12;A61B5/053;A61N1/06;A61N1/08;

  • 国家 KR

  • 入库时间 2022-08-21 11:49:42

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