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HIGH PURITY ALUMINUM COATING HARD ANODIZATION
HIGH PURITY ALUMINUM COATING HARD ANODIZATION
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机译:高纯铝涂层硬质阳极氧化
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摘要
The disclosure is directed to a method and chamber component for manufacturing a chamber component for use in a plasma processing chamber device. The chamber component includes a polished high purity aluminum coating and a hard anodized coating that is resistant to a plasma processing environment.
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