MIXED METAL OXIDE BARRIER FILMS AND ATOMIC LAYER DEPOSITION METHOD FOR MAKING MIXED METAL OXIDE BARRIER FILMS

摘要

The method of forming the thin film barrier layer 100 of a mixed metal oxide such as a mixture of aluminum, titanium, and oxygen (AlTiO) includes a substrate 110 having a surface temperature of 100 ° C. for a halide precursor, an oxygen plasma, and an organic metal precursor. Sequential exposure. Barrier layers formed in this way exhibit improved water vapor permeability over a single metal oxide film and nanolaminates of two metal oxides with similar overall thickness.