首页> 外国专利> An infrared light-emitting diode having an active layer including a deformation-compensating quantum barrier layer and a buffer layer and a manufacturing method thereof

An infrared light-emitting diode having an active layer including a deformation-compensating quantum barrier layer and a buffer layer and a manufacturing method thereof

机译:具有包括变形补偿量子势垒层和缓冲层的活性层的红外发光二极管及其制造方法

摘要

The present invention relates to an infrared light emitting diode and a method of manufacturing the same, and more particularly, to an infrared light emitting diode and a method of manufacturing the improved luminous efficiency. The light emitting diode according to the present invention is an infrared light emitting diode having a center wavelength of 940 nm, characterized in that it has an active layer including an InGaAs layer, an AlGaAs layer, and a GaAsP layer.
机译:红外发光二极管及其制造方法技术领域本发明涉及一种红外发光二极管及其制造方法,更具体地,涉及一种红外发光二极管及其制造的改进的发光效率的方法。根据本发明的发光二极管是具有940nm的中心波长的红外发光二极管,其特征在于,其具有包括InGaAs层,AlGaAs层和GaAsP层的有源层。

著录项

  • 公开/公告号KR102018688B1

    专利类型

  • 公开/公告日2019-11-04

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20180018253

  • 发明设计人 이형주;

    申请日2018-02-14

  • 分类号H01L33/30;H01L33;H01L33/06;H01L33/12;

  • 国家 KR

  • 入库时间 2022-08-21 11:47:48

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