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Apparatus and method for monitoring machine condition using defect evaluation

机译:使用缺陷评估监测机器状态的设备和方法

摘要

The present invention relates to a machine condition monitoring apparatus and method using a defect evaluation, the machine condition monitoring apparatus according to an embodiment of the present invention, by acquiring a defect signal from the machine of each defect state in advance and aligning the obtained defect signal A window generator generating a weighted window for each defect for extracting the representative envelope spectrum; A frequency filtering unit filtering the monitoring signal acquired from the machine to be monitored as a candidate frequency band; An envelope analyzer configured to envelop the filtered monitoring signal to generate an envelope spectrum; Defect evaluation for extracting the defect component of the machine to be monitored using the weight window for each defect and the generated envelope spectrum for each candidate frequency band, and calculates a defect evaluation index using the extracted defect component part; And an image generator which generates a defect image using the calculated defect evaluation index.
机译:本发明涉及一种使用缺陷评估的机器状态监视装置和方法,根据本发明实施例的机器状态监视装置,是通过预先从各缺陷状态的机器获取缺陷信号并对准所获得的缺陷来进行的。信号窗口发生器,为每个缺陷产生一个加权窗口,以提取代表包络谱。频率滤波单元将从待监视的机器获取的监视信号滤波为候选频带;包络分析仪,用于包络滤波后的监测信号以产生包络谱;使用针对每个缺陷的权重窗口和针对每个候选频带的生成的包络谱来提取要监视的机器的缺陷分量的缺陷评估,并使用所提取的缺陷分量部分来计算缺陷评估指标;以及图像生成器,其使用所计算的缺陷评估指标来生成缺陷图像。

著录项

  • 公开/公告号KR102032653B1

    专利类型

  • 公开/公告日2019-10-15

    原文格式PDF

  • 申请/专利权人 울산대학교 산학협력단;

    申请/专利号KR20180071438

  • 发明设计人 김종면;김재영;

    申请日2018-06-21

  • 分类号G01R31/34;G01R23/16;

  • 国家 KR

  • 入库时间 2022-08-21 11:47:33

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