FILM THICKNESS CONTROL DEVICE FILM THICKNESS CONTROL METHOD AND FILM FORMATION DEVICE

摘要

[PROBLEMS] To provide a film thickness control apparatus, a film thickness control method, and a film forming apparatus capable of suppressing excessive feedback control to a deposition source caused by an outlier. SOLUTION A film thickness control apparatus of one embodiment of the present invention measures a film formation rate based on an oscillation frequency of an oscillator provided in a film formation apparatus having a deposition source, and measures the deposition source based on the measured film formation rate. In the film thickness controlling device to be controlled, a rate calculating unit 431, a first filter unit 432, and a second filter unit 433 are provided. The rate calculator 431 calculates the rate conversion value for each unit time based on the oscillation frequency of the vibrator. The first filter unit (center value calculation unit 432) is configured to remove the outliers (calculate the center value) from the rate conversion value output from the rate calculator 431. The 2nd filter part (smoothing process part 433) is comprised so that the rate conversion value output from the said 1st filter part may be smoothed.