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METHODS, SYSTEMS AND DEVICE FOR CYCLOTRON PRODUCTION OF TECHNETIUM-99M

机译:M99M回旋波生产的方法,系统和装置

摘要

A process for producing technetium-99m from a molybendum-100 metal powder, comprising the steps of: (i) irradiating in a substantially oxygen-free environment, a hardened sintered target plate coating with a Mo-100 metal, with protons produced by a cyclotron; (ii) dissolving molybdenum ions and technetium ions from the irradiated target plate with an H 2 O 2 solution to form an oxide solution; (iv) raising the pH of the oxide solution to about 14; (v) flowing the pH-adjusted oxide solution through a resin column to immobilize K[TcO 4 ] ions therefrom; (vi) eluting the bound K[TcO 4 ] ions from the resin column; (vii) flowing the eluted K[TcO 4 ] ions through an alumina column to immobilize K[TcO 4 ] ions thereon; (viii) washing the immobilized K[TcO 4 ] ions with water; (ix) eluting the immobilized K[TcO 4 ] ions with a saline solution; and (x) recovering the eluted Na[TcO 4 ] ions.
机译:一种由钼100金属粉末生产tech 99m的方法,该方法包括以下步骤:(i)在基本上无氧的环境中,用Mo-100金属辐照硬化的烧结靶板涂层,并用由回旋加速器(ii)用H 2 O 2溶液溶解被辐照靶板上的钼离子和tech离子,形成氧化物溶液; (iv)将氧化物溶液的pH提高到约14; (v)使经pH调节的氧化物溶液流过树脂柱以从中固定K [TcO 4]离子; (vi)从树脂柱上洗脱结合的K [TcO 4]离子; (vii)使洗脱的K [TcO 4]离子流过氧化铝柱以将K [TcO 4]离子固定在其上; (viii)用水洗涤固定化的K [TcO 4]离子; (ix)用盐溶液洗脱固定的K [TcO 4]离子; (x)回收洗脱的Na [TcO 4]离子。

著录项

  • 公开/公告号RU2017141622A3

    专利类型

  • 公开/公告日2019-02-13

    原文格式PDF

  • 申请/专利权人

    申请/专利号RU20170141622

  • 发明设计人

    申请日0000-00-00

  • 分类号G21G1/10;H05H6;

  • 国家 RU

  • 入库时间 2022-08-21 11:46:54

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