A process for the preparation of a component with a coating of amorphous carbon, and with amorphous carbon coated component

摘要

A process for the preparation of a component with a coating of amorphous carbon comprising the steps of:a) etching the surface of a substrate (1) or a on the substrate (1) provided in the ceramic layer and forming a metallic intermediate layer (2) on the substrate (1), or of the ceramic layer, wherein the intermediate layer (2) at least one element from one of the groups iva, va, via and iiib, wherein the ceramic layer is a nitride, a carbide or carbonitride of at least one element of the groups iva, va, via and iiib, wherein the etching and the layer formation by means of applying a negative voltage of not less than 300 v and not more than 1500 v to the substrate (1) in the case of a pressure of the atmosphere of not more than 0,133 pa and by irradiating the surface of the substrate (1), or of the ceramic layer with ions of at least one, the metallic elements forming the intermediate layer (2); andb) forming an amorphous carbon layer (3) by means of a vacuum - light arc deposition on the metallic intermediate layer (2), wherein the metallic intermediate layer (2) during the formation of the amorphous carbon layer (3) is converted into a carbide-containing intermediate layer, characterized in that the carbide-containing intermediate layer with a thickness of 0,5 nm or more and less than 5 nm forms.