Projection exposure apparatus with a processing device with beam deflection for compacting optical elements and method for compacting mirrors in a projection exposure apparatus

摘要

The invention relates to a projection exposure apparatus (1) comprising an illumination optics (4) and a projection objective (9) with a plurality of optical elements (35, 35 ', 35 ", 35' '') for imaging an object onto an image plane and a processing device ( 30) for compacting at least one optical element (35, 35 ', 35 ", 35' ''), wherein the processing device (30) comprises a radiation source (32), wherein the processing device (30) comprises a beam deflection (33) Furthermore, the invention relates to a method for compacting an optical element (35, 35 ', 35 ", 35' '') in a projection exposure apparatus (1).