feldfacettenspiegel for use in an illumination of a projektionsbelichtungsanlage teu for the projektonslithographie

摘要

A field facets mirror is for use in a part of a projection exposure apparatus for the euv - of projection lithography. The field facets mirror has a plurality of field facets (10) with reflecting surfaces for euv - illumination light. The reflective surfaces have an edge contour with two opposite longer facets sides (32, 33), measured along a facets - long dimension (x), and two in comparison with this short facets sides (34, 35), measured along a facets - short dimension (y). The longer facets sides (32, 33) of at least some of the field facets (10) have a different from one another curved shape. At least one of the two longer facets sides (32, 33) is formed aspherical. At least some of the field facets (10) have different centers of extensions (d) along the facets - short dimension (y). This results in a field facets mirror, in which a superposed image of the field facets in an object field of the projection exposure system is improved.n="22"