首页> 外国专利> METHOD FOR MANUFACTURING A PHOTOVOLTAIC OR PHOTO-DETECTOR DEVICE WITH ELECTRONIC JUNCTION N-PERT AND PHOTOVOLTAIC DEVICE OR PHOTO-DETECTOR WITH ELECTRONIC JUNCTION

METHOD FOR MANUFACTURING A PHOTOVOLTAIC OR PHOTO-DETECTOR DEVICE WITH ELECTRONIC JUNCTION N-PERT AND PHOTOVOLTAIC DEVICE OR PHOTO-DETECTOR WITH ELECTRONIC JUNCTION

机译:用电子结制造光电或光电检测器的方法N-pert和用电子结制造光电或光电检测器的方法

摘要

The invention relates to a method for manufacturing a n-PERT electronic junction photovoltaic or photodetector device or to a solar panel based on n-PERT photovoltaic devices. According to the invention, the method comprises the following steps: a) texturing at least one face of a substrate (4) of n-doped crystalline silicon to generate a micro-textured surface, the micro-textured surface comprising micro-textured textures; b) following step a), diffusion of boron in the crystalline silicon substrate through the micro-textured surface to generate a layer (3) of doped silicon, the layer (3) of p-doped silicon forming a transmitter of the electronic junction; and c) following step b), etching the micro-textured surface to remove a surface thickness of the p-doped silicon layer (3) and to generate a micro-textured and nano-textured surface at the surface of the layer (3) of p-doped silicon forming the emitter.
机译:本发明涉及一种用于制造n-PERT电子结光伏或光电检测器装置的方法,或者涉及一种基于n-PERT光伏装置的太阳能电池板。根据本发明,该方法包括以下步骤:a)使n掺杂的晶体硅的衬底(4)的至少一个表面纹理化以产生微纹理化的表面,该微纹理化的表面包括微纹理化的纹理; b)在步骤a)之后,使硼在晶体硅衬底中穿过微结构化表面扩散,以生成掺杂硅层(3),p掺杂硅层(3)形成电子结的发射器; c)在步骤b)之后,蚀刻微纹理化表面以去除p掺杂的硅层(3)的表面厚度,并在层(3)的表面上产生微纹理化和纳米纹理化的表面。形成发射极的p掺杂硅的数量。

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