首页> 外国专利> METHOD FOR MANUFACTURING A PHOTOVOLTAIC DEVICE OR PHOTO-DETECTOR WITH N-PERT ELECTRONIC JUNCTION AND PHOTOVOLTAIC DEVICE OR PHOTO-DETECTOR WITH ELECTRONIC JUNCTION

METHOD FOR MANUFACTURING A PHOTOVOLTAIC DEVICE OR PHOTO-DETECTOR WITH N-PERT ELECTRONIC JUNCTION AND PHOTOVOLTAIC DEVICE OR PHOTO-DETECTOR WITH ELECTRONIC JUNCTION

机译:用n-pert电子连接制造光电装置或光电检测器的方法和使用电子连接制造光电装置或光电检测器的方法

摘要

The invention relates to a method of manufacturing a photovoltaic device or photo-detector with electronic junction n-PERT or a solar panel based on n-PERT photovoltaic devices. According to the invention, the method comprises the following steps: a) texturing at least one face of a substrate (4) of n-doped crystalline silicon to generate a micro-textured surface, the micro-textured surface comprising micro- textures; b) following step a), diffusion of boron into the crystalline silicon substrate through the micro-textured surface to generate a layer (3) of doped silicon, the layer (3) of p-doped silicon forming an emitter of the electronic junction; and c) following step b), etching the micro-textured surface to remove a surface thickness of the layer (3) of p-doped silicon and to generate a micro-textured and nano-textured surface on the surface of the p-doped silicon layer (3) forming the emitter.
机译:本发明涉及一种具有电子结n-PERT或基于n-PERT光伏器件的太阳能电池板的光伏器件或光电探测器的制造方法。根据本发明,该方法包括以下步骤:a)使n掺杂的晶体硅的衬底(4)的至少一个表面纹理化以产生微纹理化的表面,该微纹理化的表面包括微纹理; b)在步骤a)之后,通过微纹理化表面将硼扩散到晶体硅衬底中,以生成掺杂硅层(3),p掺杂硅层(3)形成电子结的发射极; c)在步骤b)之后,蚀刻微纹理化表面以去除p掺杂硅层(3)的表面厚度,并在p掺杂的表面上生成微纹理化和纳米纹理化的表面形成发射极的硅层(3)。

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