INTERFEROMETRIC MEASUREMENT APPARATUS, MEASUREMENT METHOD, AND METHOD OF MANUFACTURING ARTICLE WITH REDUCED INFLUENCE OF CYCLIC ERRORS

摘要

A measurement apparatus for measuring a shape of a test surface (1), comprises an optical system (20) which irradiates a point on the test surface and on a reference surface (25), and causes test light and reference light reflected to interfere with each other, a detector (30) configured to detect an optical path length difference between the test light and the reference light by using interfering light, and a processor (40) configured to determine a position of the point based on a plurality of detection results. A measurement apparatus for measuring a shape of a test surface (1), comprising a probe (80) brought into contact with a measurement point on the test surface; a detector (72) provided on the probe and configured to irradiate a standard surface (71z) and a reference surface with light and detect interfering light of the test light reflected by the standard surface and the reference light reflected by the reference surface, thereby detecting an optical path length difference between test light and reference light; and a processor (87) configured to determine a position of the measurement point based on a plurality of detection results by the detector. In both cases the detection results are obtained in n states in which optical path lengths of the test light are different from each other by 1/n (n ‰¥ 2) of a cycle of the error and wherein a detection result includes an error which cyclically changes.