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ROTATING TYPE CHARGE CONVERTING FILM OF ION BEAM CHARGE CONVERTING DEVICE AND ION BEAM CHARGE CONVERTING METHOD

机译:离子束电荷转换装置的旋转型电荷转换膜和离子束电荷转换方法

摘要

An object of the present invention is to provide a charge stripping film in a charge stripping device of an ion beam, which has high heat resistance and no toxicity, with which there is no risk of activation, with which an ion beam can be made multivalent even if the charge stripping film is thin, and which is resistant to high-energy beam radiation over an extended period of time. The present invention comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film having a thermal conductivity of 20 W/mK or more in a film surface direction at 25°C, and a film thickness of the carbon film is more than 3m and less than 10m. The present invention also comprises a charge stripping film used in a device which strips a charge of an ion beam, wherein the charge stripping film is a rotary charge stripping film comprising a carbon film produced by a polymer annealing method, and a film thickness of the carbon film is more than 3m and less than 10m.
机译:本发明的目的是提供一种在离子束的电荷剥离装置中的电荷剥离膜,其具有高的耐热性且无毒性,不存在被活化的风险,可以使离子束为多价的。即使电荷剥离膜很薄,并且可以长时间抵抗高能束辐射。本发明包括在用于剥离离子束的电荷的装置中使用的电荷剥离膜,其中所述电荷剥离膜是旋转电荷剥离膜,所述旋转电荷剥离膜包括膜中具有20W / mK或更高的导热率的碳膜。碳膜的膜厚为25℃时的表面方向为大于3m且小于10m。本发明还包括用于剥离离子束的电荷的装置中的电荷剥离膜,其中所述电荷剥离膜是旋转电荷剥离膜,所述旋转电荷剥离膜包括通过聚合物退火法制备的碳膜,并且碳膜大于3m且小于10m。

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