首页> 外国专利> POWER SUPPLY DEVICE FOR PLASMA, PLASMA DEVICE, AND METHOD FOR CONTROLLING POWER SUPPLY DEVICE FOR PLASMA

POWER SUPPLY DEVICE FOR PLASMA, PLASMA DEVICE, AND METHOD FOR CONTROLLING POWER SUPPLY DEVICE FOR PLASMA

机译:等离子电源装置,等离子装置及等离子电源装置的控制方法

摘要

A plasma power supply device includes an AC power supply configured to generate an AC voltage of a predetermined frequency for application to a pair of electrodes by way of a power supply harness which is replaceable partially or wholly to change a wiring length and which is flexible, and a control section configured to set the predetermined frequency of the AC power supply so that the frequency becomes lower as the power supply harness becomes longer.
机译:一种等离子电源装置,包括交流电源,该交流电源被配置为通过电源线束产生预定频率的交流电压以施加到一对电极,该电源线束可部分或全部更换以改变配线长度,并且是柔性的,控制部,其设定为将交流电源的规定频率设定为随着电源线束的变长而降低。

著录项

  • 公开/公告号EP3716735A1

    专利类型

  • 公开/公告日2020-09-30

    原文格式PDF

  • 申请/专利权人 FUJI CORPORATION;

    申请/专利号EP20170933154

  • 发明设计人 TAKIKAWA SHINJI;

    申请日2017-11-22

  • 分类号H05H1/24;

  • 国家 EP

  • 入库时间 2022-08-21 11:39:20

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