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METHOD FOR DETERMINING ROOT CAUSES OF EVENTS OF A SEMICONDUCTOR MANUFACTURING PROCESS AND FOR MONITORING A SEMICONDUCTOR MANUFACTURING PROCESS
METHOD FOR DETERMINING ROOT CAUSES OF EVENTS OF A SEMICONDUCTOR MANUFACTURING PROCESS AND FOR MONITORING A SEMICONDUCTOR MANUFACTURING PROCESS
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机译:确定半导体制造过程中事件根源的方法以及用于监测半导体制造过程的方法
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摘要
Described is a user interface for designing, configuring and/or editing a control flow representing a control strategy associated with a semiconductor manufacturing process. The user interface comprises a library of control elements, each control element being selectable by a user, a control flow editor configured to organize said control elements into a control flow representing the control strategy; and a communication interface for communicating the control flow to a calculation engine configured to evaluate the control flow.
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