首页> 外国专利> DIFFRACTION OPTICAL ELEMENT, MULTIFACETED BODY, INSPECTION METHOD OF MULTIFACETED BODY, LIGHT IRRADIATION DEVICE, ADJUSTMENT METHOD OF LIGHT IRRADIATION DEVICE

DIFFRACTION OPTICAL ELEMENT, MULTIFACETED BODY, INSPECTION METHOD OF MULTIFACETED BODY, LIGHT IRRADIATION DEVICE, ADJUSTMENT METHOD OF LIGHT IRRADIATION DEVICE

机译:衍射光学元件,多面体,多面体的检查方法,光照射装置,光照射装置的调整方法

摘要

PROBLEM TO BE SOLVED: To provide a diffraction optical element, a multifaceted body, an inspection method of multifaceted body, a light irradiation device and an adjustment method of light irradiation device capable of easily confirming that light from a light source hits a position deviated from a diffraction grating, and to provide the diffraction optical element, the multifaceted body, the inspection method of multifaceted body, the light irradiation device and the adjustment method of light irradiation device capable of grasping the position and the deviation amount in the case where the light from the light source hits the position deviated from the diffraction grating.;SOLUTION: A diffraction optical element 10 includes: a first diffraction grating region 10b in which a diffraction grating for projecting a first projection pattern 23 is constituted; and a second diffraction grating region 10c provided at least at part of an outer peripheral region of the first diffraction grating region 10b, and projecting a second projection pattern in which at least part is different from the first projection pattern 23. The second projection pattern includes a position deviation detection projection pattern 24 capable of determining the fact that the light which is to be radiated to the first diffraction grating region 10b is radiated to the second diffraction grating region 10c due to the position deviation.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2020,JPO&INPIT
机译:解决的问题:为了提供一种衍射光学元件,多面体,多面体的检查方法,光照射装置以及光照射装置的调整方法,能够容易地确认来自光源的光照射到偏离其的位置。衍射光栅,提供衍射光学元件,多面体,多面体的检查方法,光照射装置以及光照射装置的调整方法,能够掌握光发生时的位置和偏差量。解决方案:衍射光学元件10包括:第一衍射光栅区域10b,在该第一衍射光栅区域10b中构成用于投影第一投影图案23的衍射光栅;以及第二衍射光栅区域10c至少设置在第一衍射光栅区域10b的外周区域的一部分上,并且投影第二投影图案,其中第二投影图案的至少一部分与第一投影图案23不同。位置偏差检测投影图案24,其能够确定由于位置偏差而将要照射到第一衍射光栅区域10b的光照射到第二衍射光栅区域10c的事实。 :(C)2020,JPO&INPIT

著录项

  • 公开/公告号JP2020024284A

    专利类型

  • 公开/公告日2020-02-13

    原文格式PDF

  • 申请/专利权人 DAINIPPON PRINTING CO LTD;

    申请/专利号JP20180148501

  • 发明设计人 OKAWA KOJIRO;INAZUKI YUICHI;

    申请日2018-08-07

  • 分类号G02B5/18;G01M11;

  • 国家 JP

  • 入库时间 2022-08-21 11:36:44

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