首页> 外国专利> MIRROR AND MIRROR SUBSTRATE WITH HIGH ASPECT RATIO, AND METHOD AND MEANS FOR PRODUCING SUCH MIRROR SUBSTRATE

MIRROR AND MIRROR SUBSTRATE WITH HIGH ASPECT RATIO, AND METHOD AND MEANS FOR PRODUCING SUCH MIRROR SUBSTRATE

机译:具有高纵横比的镜面和镜面基板,以及生产这种镜面基板的方法和装置

摘要

To provide a mirror substrate which has a high aspect ratio and small absolute thickness and also offers superior surface quality, dimensional precision and stability, and to provide a support body that can be used to produce the high aspect ratio mirror substrate and a mirror, and a method of manufacturing such mirror substrate and mirror.SOLUTION: A mirror substrate disclosed herein has a mean linear thermal expansion coefficient, a ratio of a lateral dimension to a maximum thickness, a weight per unit area, and a surface roughness, which are within specific conditional ranges.SELECTED DRAWING: None
机译:提供具有高纵横比和小的绝对厚度并且还提供优异的表面质量,尺寸精度和稳定性的镜基板,并提供可用于生产高纵横比镜基板和镜的支撑体,以及解决方案:本文公开的镜基板具有均在范围内的平均线性热膨胀系数,横向尺寸与最大厚度之比,每单位面积的重量和表面粗糙度。特定条件范围。选择的绘图:无

著录项

  • 公开/公告号JP2020024416A

    专利类型

  • 公开/公告日2020-02-13

    原文格式PDF

  • 申请/专利权人 SCHOTT AG;

    申请/专利号JP20190146326

  • 申请日2019-08-08

  • 分类号G02B5/08;C03C19;C03C10/12;C03C10/04;C03C3/06;G03F7/20;B32B18;

  • 国家 JP

  • 入库时间 2022-08-21 11:36:45

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