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COATING, DEVELOPMENT APPARATUS AND COATING, AND DEVELOPMENT METHOD

机译:涂层,开发装置和涂层以及开发方法

摘要

To perform a high uniformity process between a plurality of substrates.SOLUTION: An apparatus is structured by constructing: a processing block having a plurality of substrate conveyance regions which is separated each other when they are vertically laminated; a processing module provided in the plurality of substrate conveyance regions; a conveyance mechanism that is provided to each of the plurality of substrate conveyance regions, and conveys a substrate between a conveyance block and a processing module; a temperature adjustment module that adjusts a temperature of the substrate before the conveyance to the processing module for adjusting the temperature of the substrate in at least one processing module from the plurality of processing modules, and performs the conveyance of the substrate of which the temperature is adjusted by the conveyance mechanism; a temperature sensor that detects an atmospheric temperature of at least one substrate conveyance region of the plurality of substrate conveyance regions; and a temperature changing mechanism that changes the temperature of the substrate in the temperature adjustment module on the basis of the atmospheric temperature detected by the temperature sensor.SELECTED DRAWING: Figure 12
机译:解决方案:一种装置通过构造:具有多个基板传送区域的处理块构成,当垂直层叠它们时,它们彼此分开;处理模块设置在多个基板输送区域中;输送机构,其设置在多个基板输送区域的每一个上,并在输送块与处理模块之间输送基板。温度调节模块,其在从多个处理模块中向至少一个处理模块中的用于调节基板温度的传送至处理模块之前调节基板的温度,并且执行温度为由输送机构调整;温度传感器,其检测多个基板输送区域中的至少一个基板输送区域的大气温度。图12是根据温度传感器检测到的大气温度改变温度调节模块中基板温度的温度变化机构。

著录项

  • 公开/公告号JP2020061443A

    专利类型

  • 公开/公告日2020-04-16

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LTD;

    申请/专利号JP20180191170

  • 申请日2018-10-09

  • 分类号H01L21/027;G03F7/30;G03F7/16;H01L21/677;

  • 国家 JP

  • 入库时间 2022-08-21 11:36:36

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