Advanced in situ particle detection system for semiconductor substrate processing system

摘要

An FI having an in situ particle detector and a method for detecting particles in the FI are provided. In one aspect, the FI includes a fan, a substrate support, a particle detector, and an exhaust. In operation, the fan, the substrate support, and the particle detector are arranged such that the fan produces a laminar flow of air toward the exhaust and onto the substrate on the substrate support. A particle detector positioned downstream from the substrate support and upstream from the exhaust port analyzes the air and detects the particle concentration before the particles are exhausted. The collected particle detection data can be combined with data from other sensors in the FI and used to identify the source of particle contamination. The particle detector may also be incorporated into other system components including, but not limited to, a load lock or buffer chamber to detect the particle concentration therein. [Selection diagram] Figure 2