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PRODUCTION METHOD OF HIGH PURITY COBALT CHLORIDE AQUEOUS SOLUTION

机译:高纯氯化钴水溶液的制备方法

摘要

To provide an efficient production method of a high purity cobalt chloride aqueous solution of a low Mg concentration.SOLUTION: The production method of a high purity cobalt chloride aqueous solution is comprised of a solvent extraction step S1 and solution cleaning steps S2-S4. The solvent extraction step S1 is comprised of an extraction stage S11 of mixing an amine-based extraction agent in a nickel chloride aqueous solution containing Co and MG and thus extracting Co into an organic phase to obtain a nickel chloride aqueous solution without Co, a washing stage S12 of washing the organic phase with a washing fluid, and a back extraction stage S13 of back extracting the organic phase after the washing to obtain a crude cobalt chloride aqueous solution. In the solution cleaning steps S2-S4, impurities are removed by adding cobalt carbonate slurry or the like to a mixture of the crude cobalt chloride aqueous solution and the cobalt chloride aqueous solution containing Mg. The high purity cobalt chloride aqueous solution obtained in the solution cleaning steps S2-S4 is supplied to an electrolysis step S5. An electrolysis waste solution discharged from the electrolysis step S5 is distributed to a solution for the washing fluid, a solution for a raw material for producing the cobalt carbonate, a solution for repulping the produced cobalt carbonate, and a solution to be concentrated by evaporation for feeding to the electrolysis step.SELECTED DRAWING: Figure 1
机译:为了提供一种有效的生产低Mg浓度的高纯度氯化钴水溶液的方法。解决方案:高纯度氯化钴水溶液的生产方法包括溶剂萃取步骤S1和溶液清洗步骤S2-S4。溶剂萃取步骤S1包括萃取步骤S11,该萃取步骤S11是将胺类萃取剂在含有Co和MG的氯化镍水溶液中混合,然后将Co萃取到有机相中以获得不含Co的氯化镍水溶液,洗涤。步骤S12,用洗涤液洗涤有机相,反萃取步骤S13,洗涤后反萃取有机相,得到粗氯化钴水溶液。在溶液清洗步骤S2-S4中,通过向粗制氯化钴水溶液和含Mg的氯化钴水溶液的混合物中添加碳酸钴浆料等来除去杂质。将在溶液清洗步骤S2-S4中获得的高纯度氯化钴水溶液供应到电解步骤S5。从电解步骤S5排出的电解废液分配到洗涤液用溶液,用于生产碳酸钴的原料溶液,用于再制浆所生产的碳酸钴的溶液和通过蒸发而浓缩的溶液中。进料到电解步骤选定的图纸:图1

著录项

  • 公开/公告号JP2020019664A

    专利类型

  • 公开/公告日2020-02-06

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL MINING CO LTD;

    申请/专利号JP20180143223

  • 申请日2018-07-31

  • 分类号C01G51/08;C01G51/06;C22B3/28;C22B3/42;C22B3/44;C22B23;C25C1/08;C25C7/06;B01D11/04;C02F1/04;C02F1/62;B01J41/07;B01J41/12;B01J47/02;H01M4/525;

  • 国家 JP

  • 入库时间 2022-08-21 11:35:11

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