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HIGH-PURITY RAW MATERIAL GAS SUPPLY METHOD, AND HIGH-PURITY RAW MATERIAL GAS SUPPLY FACILITY

机译:高纯度原料气的供应方法及高纯度原料气的供应

摘要

To provide a high-purity raw material gas supply method which is capable of reducing a failure in a raw material gas supply facility and supplies a stable high-quality and/or high-purity boron-based high-purity raw material gas.SOLUTION: Processing of supply of an inert gas to a main pipe (supply pipe) La (step S1) and exhaustion and vacuuming (step S2) is repeated until a concentration of moisture and boric acid in the main pipe La becomes equal to or lower than a specific value (step S3). Processing of supply of an inert gas to a boron-based gas container 2 (step S4) and exhaustion and vacuuming (step S5) is repeated until a concentration of moisture and boric acid in the boron-based gas container 2 becomes equal to or lower than a specific value (step S6). Processing of supply of a high-purity raw material gas to the boron-based gas container 2 (step S7) and exhaustion and vacuuming (step S8) is repeated until a concentration of moisture and boric acid in the boron-based gas container 2 becomes equal to or lower than a specific value (step S9).SELECTED DRAWING: Figure 1
机译:提供一种高纯度原料气体供应方法,该方法能够减少原料气体供应设备中的故障并提供稳定的高质量和/或高纯度硼基高纯度原料气体。重复向主管(供给管)La供应惰性气体(步骤S1)以及排气和抽真空(步骤S2)的处理,直到主管La中的水分和硼酸的浓度变为等于或低于a。特定值(步骤S3)。重复向硼基气体容器2供应惰性气体的处理(步骤S4)以及排气和抽真空(步骤S5),直到硼基气体容器2中的水分和硼酸的浓度等于或低于该浓度为止。比特定值大(步骤S6)。重复向硼基气体容器2供应高纯度原料气体的处理(步骤S7)以及排气和抽真空(步骤S8),直到硼基气体容器2中的水分和硼酸的浓度变为等于或小于特定值(步骤S9)。选定的图:图1

著录项

  • 公开/公告号JP2020070838A

    专利类型

  • 公开/公告日2020-05-07

    原文格式PDF

  • 申请/专利权人 TAIYO NIPPON SANSO CORP;

    申请/专利号JP20180204029

  • 发明设计人 TAKAYANAGI SATOSHI;ABE TOYOHIKO;

    申请日2018-10-30

  • 分类号F17C5;

  • 国家 JP

  • 入库时间 2022-08-21 11:35:04

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