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Sample analysis system, cleaning liquid preparation device, sample analysis device, and cleaning liquid supply method

机译:样本分析系统,清洗液准备装置,样本分析装置以及清洗液的供给方法

摘要

Disclosed is a sample analysis system (100) comprising a cleaning liquid preparation apparatus (4) that prepares a cleaning liquid, and a sample analyzer (1) that comprises a measurement unit (2) that measures a sample and a reservoir that stores the cleaning liquid prepared by the cleaning liquid preparation apparatus (4). The sample analyzer (1) cleans at least a part of the measurement unit (2) with the cleaning liquid. The cleaning liquid preparation apparatus (4) selectively executes a first supply mode to supply the cleaning liquid to the reservoir when a liquid amount in the reservoir reaches a first amount, and a second supply mode to supply the cleaning liquid to the reservoir when the liquid amount in the reservoir reaches a second amount less than the first amount.
机译:公开了一种样品分析系统(100),其包括制备清洁液的清洁液制备装置(4)和样品分析仪(1),所述样品分析仪(1)包括测量样品的测量单元(2)和存储所述清洁剂的容器由清洗液制备装置(4)制备的液体。样本分析仪(1)用清洗液清洗测量单元(2)的至少一部分。清洗液准备装置(4)在贮存器中的液体量达到第一量时选择性地执行第一供应模式以将清洗液供应到贮存器,并且当液体呈液态时,清洗液制备装置(4)选择性地执行第二供应模式以将清洗液供应到贮存器。储器中的第二数量达到小于第一数量的第二数量。

著录项

  • 公开/公告号JP6742086B2

    专利类型

  • 公开/公告日2020-08-19

    原文格式PDF

  • 申请/专利权人 シスメックス株式会社;

    申请/专利号JP20150203672

  • 发明设计人 ▲高▼木 竜輝;若宮 裕二;

    申请日2015-10-15

  • 分类号G01N35/10;G01N35;

  • 国家 JP

  • 入库时间 2022-08-21 11:34:59

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