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Surveying equipment inspection system, equipment adjustment method using surveying equipment inspection system

机译:测量设备检查系统,使用测量设备检查系统的设备调整方法

摘要

To provide a measurement apparatus inspection system 100 which does not require a dedicated space, nor a space which an inspector enters between pedestals, and is compact in a size.SOLUTION: A measurement apparatus inspection system 100 has: a pedestal attachment base 110; a main pedestal 113 which is erected on the pedestal attachment base 110, and attached with an optical apparatus for use in inspection; an apparatus pedestal 115 which is erected on the pedestal attachment base 110 in a position opposing the main pedestal 113, and on which an inspected measurement apparatus 50 is placed; a first pedestal 111 which is erected on the pedestal attachment base 110, and on which a first automatic level 130a is placed; a second pedestal 112 which is erected on the pedestal attachment base 110, and on which a second automatic level 130b is placed; and an imaging unit attached to either of an eyepiece part of the optical apparatus or the inspected measurement apparatus 50, and imaging the inside of the eyepiece part. The apparatus pedestal 115 is arranged between the first pedestal 111 and the second pedestal 112.SELECTED DRAWING: Figure 1
机译:为了提供一种测量装置检查系统100,该测量装置检查系统100不需要专用空间,也不需要检查者进入基座之间的空间,并且尺寸紧凑。主台架113竖立在台架安装座110上,并安装有用于检查的光学设备。装置台架115竖立在台架安装基座110上与主台架113相对的位置,并放置有被检查的测量装置50。第一基座111竖立在基座安装基座110上,并在其上放置第一自动水准仪130a;第二基座112竖立在基座安装基座110上,并在其上放置第二自动水准仪130b;成像单元安装在光学设备的目镜部分或被检查的测量设备50中的任何一个上,并且对目镜部分的内部进行成像。装置基座115布置在第一基座111和第二基座112之间。

著录项

  • 公开/公告号JP6758343B2

    专利类型

  • 公开/公告日2020-09-23

    原文格式PDF

  • 申请/专利权人 株式会社埼玉測機社;

    申请/专利号JP20180102385

  • 发明设计人 國光 勝三;高木 聖二郎;

    申请日2018-05-29

  • 分类号G01C15;G01C5/02;G01C25;

  • 国家 JP

  • 入库时间 2022-08-21 11:34:16

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