Method for preparing sample for interface analysis and method for interface analysis

摘要

PROBLEM TO BE SOLVED: To provide a method capable of stably preparing a specimen having a metal layer and a resin layer laminated in contact with each other and suitable for the analysis of the vicinity of an interface between the metal layer and the resin layer by a hard X-ray photoelectron spectroscopy.SOLUTION: The preparation method of an interface analysis specimen includes: a step of preparing a gallium arsenic substrate 40 having a main surface 40A which has a surface roughness Ra of 10 nm or less; a step of forming a silicon dioxide layer 30 so that it contacts the main surface 40A; a step of forming a metal layer 10 having a thickness of 2 nm to 50 nm so that it contacts a main surface 30A of the silicon dioxide layer 30 opposite to the gallium arsenic substrate 40 side; a step of forming a first laminate 2 by forming a resin layer 20 so that it contacts a main surface 10A of the metal layer 10 opposite to the silicon dioxide layer 30 side; a step of acquiring a second laminate by removing the gallium arsenic substrate 40 from the first laminate 2; and a step of removing the silicon dioxide layer 30 from the second laminate.SELECTED DRAWING: Figure 3