The quality inspection method according to an embodiment of the present invention is a quality inspection method for a chemical liquid used for manufacturing a semiconductor substrate, including a step W of preparing a first container and washing at least a portion of a liquid contact portion by using a portion of the chemical liquid, a step A of performing concentration of a portion of the chemical liquid by using the washed first container so as to obtain c liquid, a step B of performing measurement of a content of a specific component in c liquid, and a step C of comparing the content of the specific component with a preset standard value. The step W, the step A, the step B, and the step C are performed in this order, at least the step W and the step A are performed in a clean room having cleanliness equal to or higher than class 4 specified in ISO14644-1:2015, the concentration is performed in at least one kind of inert gas selected from the group consisting of an Ar gas, a He gas, and a N2 gas or under reduced pressure, and the measurement is performed by a predetermined measurement method.
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