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Light stabilizer masterbatch and method for producing the same

机译:光稳定剂母料及其生产方法

摘要

Provided are: a photostabilizer masterbatch in which the problems of the occurrence of blocking over time due to the effect of temperature fluctuations in the environment and the difficulty in handling due to the resulting solidification in aggregates are overcome; and a method of producing the same. The photostabilizer masterbatch is obtained by adding and mixing 80 to 300 parts by mass of (B) a hindered amine compound represented by the following Formula (1) with respect to 100 parts by mass of (A) a silica produced by a wet process and subsequently further adding and mixing 5 to 50 parts by mass of (C) a silica produced by a dry process: (wherein, R 1 represents a hydrogen atom, a hydroxy group, an alkyl, hydroxyalkyl, alkoxy or hydroxyalkoxy group having 1 to 30 carbon atoms, or an oxy radical; and R 2 represents an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or a group represented by the following Formula (2)) (wherein, R 3 represents the same as R 1 in the Formula (1)).
机译:提供:一种光稳定剂母料,其中克服了由于环境温度波动的影响而随着时间的流逝而发生阻塞的问题以及由于聚集体的固化而导致的处理困难的问题;及其制造方法。相对于100质量份(A)通过湿法制造的二氧化硅,将80〜300质量份(B)下式(1)表示的受阻胺化合物添加并混合,从而得到光稳定剂母料。随后进一步添加并混合5至50质量份的(C)干法生产的二氧化硅:(其中,R 1代表氢原子,羟基,具有1至30个碳原子的烷基,羟烷基,烷氧基或羟基烷氧基或氧基;并且R 2代表具有1至30个碳原子的烷基,具有2至30个碳原子的烯基,或由下式(2)表示的基团)(其中,R 3表示与式(1)中的R 1相同)。

著录项

  • 公开/公告号JP6613299B2

    专利类型

  • 公开/公告日2019-11-27

    原文格式PDF

  • 申请/专利权人 株式会社ADEKA;

    申请/专利号JP20170510116

  • 发明设计人 綾部 敬士;臼井 崇;

    申请日2016-03-30

  • 分类号C08J3/22;C08L101;C08K5/3435;C08L23;C08K9/04;

  • 国家 JP

  • 入库时间 2022-08-21 11:33:08

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