The present invention uses a transparent photosensitive resin composition that suppresses variations in the height of the photospacer, is resistant to plastic deformation, that is, can form a photospacer having a high elastic recovery rate at the same time. It is an object of the present invention to provide a photo spacer, a liquid crystal display device, a method for manufacturing a photo spacer, a method for manufacturing a liquid crystal display device, and a use of a transparent photosensitive resin composition for lens scan exposure. The present invention is a transparent photosensitive resin composition containing at least an alkali-soluble resin, a photopolymerization initiator and a polymerizable monomer, wherein the alkali-soluble resin is A) a structural unit represented by the following general formula (1). , B) The structural unit represented by the following general formula (2) and C) It has a structural unit represented by the following general formula (3) and has A transparent photosensitive resin composition having an ethylenically unsaturated group equivalent of the alkali-soluble resin of 400 g / mol or less. [Chemical 1] (In the above general formula (1), R 1 represents a hydrogen atom or a methyl group.) [Chemical 2] (In the above general formula (2), R 2 and R 3 each independently represent a hydrogen atom or a methyl group. X is −CH 2 CH (OH) CH 2 O (C = O) −, −CH 2 CH 2 NH (C = O) O (CH 2 ) m O (C = O) − or − (CH 2 ) n O (C = O) NHCH 2 CH 2 O (C = O) −, but m and n represents an integer of 1 to 4 independently.) [Chemical 3] (In the above general formula (3), Y is an aryl group having 6 to 11 carbon atoms which may have a substituent, and an aralkyl group or a substituent having 7 to 10 carbon atoms which may have a substituent. Indicates a cycloalkyl group having 3 to 10 carbon atoms which may be possessed.)
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