Near-infrared curable ink composition and method for producing the same, near-infrared curable film, and stereolithography method

摘要

A near-infrared ray curable ink composition provided on a predetermined substrate and having excellent adhesion to the substrate when being cured by being irradiated with near-infrared ray, and a near-infrared ray obtained from the near-infrared ray curable ink composition A cured film and a stereolithography method using the near-infrared curable ink composition are provided. A near-infrared ray curable ink composition containing a composite tungsten oxide as near-infrared absorbing fine particles and an uncured thermosetting resin, wherein the composite tungsten oxide fine particles have a value of a ratio of their XRD peak top strengths. Provided is a near-infrared curable ink composition having a value of 0.13 or more when the value of XRD peak intensity on the (220) plane of a silicon powder standard sample (NIST, 640c) is 1.