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Method for forming electric Ni-PB-based plating film, said film, and sliding member provided with said film

机译:形成Ni-PB基电镀膜的方法,所述膜和具有所述膜的滑动构件

摘要

The method for forming a Ni-P-B-based plating film includes a secondary brightener including Ni ion, phosphite ion, alkylamine borane, acetic acid, at least one primary brightener, and at least one surfactant. Electroplating is performed in a plating bath. In the above plating bath, the concentration of alkylamine borane is 1.37 mmol / L or more, and the concentration of acetic acid is 0.70 mol / L or more and less than 2.80 mol / L. Thereby, even if the current density is increased to 80 A / dm2 or more and the film formation rate is increased, occurrence of appearance defects such as burns and abnormal deposition is reduced, and a plating film having a high hardness of Hv700 or more without baking treatment is provided. Can be formed with high production efficiency.
机译:用于形成Ni-P-B基镀膜的方法包括第二增白剂,其包括Ni离子,亚磷酸根离子,烷基胺硼烷,乙酸,至少一种第一增白剂和至少一种表面活性剂。电镀在电镀浴中进行。在上述镀浴中,烷基胺硼烷的浓度为1.37mmol / L以上,乙酸的浓度为0.70mol / L以上且小于2.80mol / L。因此,即使电流密度增加至80A / dm2以上,可以提高成膜速度,减少烧伤,异常析出等外观不良的发生,并且可以提供未经烘烤处理,且具有Hv700以上的高硬度的镀膜。可以形成高生产效率。

著录项

  • 公开/公告号JPWO2018193756A1

    专利类型

  • 公开/公告日2020-02-27

    原文格式PDF

  • 申请/专利权人 アイシン精機株式会社;

    申请/专利号JP20190513268

  • 发明设计人 笹山 裕晃;

    申请日2018-03-14

  • 分类号C25D3/12;C25D7;

  • 国家 JP

  • 入库时间 2022-08-21 11:31:51

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