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Method of electroplating metal into recessed feature and electroplating layer in recessed feature

机译:将金属电镀到凹陷特征中的方法和在凹陷特征中的电镀层

摘要

A method of electroplating a metal into a recessed feature is provided, which includes: contacting a surface of the recessed feature with an electroplating solution comprising metal ions, an accelerator additive, a suppressor additive and a leveler additive, in which the recessed feature has at least two elongated regions and a cross region laterally between the two elongated regions, and a molar concentration ratio of the accelerator additive: the suppressor additive: the leveler additive is (8-15):(1.5-3):(0.5-2); and electroplating the metal to form an electroplating layer in the recessed feature. An electroplating layer in a recessed feature is also provided.
机译:提供了一种将金属电镀到凹陷特征中的方法,该方法包括:使凹陷特征的表面与包含金属离子,促进剂添加剂,抑制剂添加剂和整平添加剂的电镀溶液接触,其中凹陷特征具有至少至少两个伸长区域和两个伸长区域之间横向的交叉区域,以及促进剂添加剂:抑制剂添加剂:流平添加剂的摩尔浓度比为(8-15):( 1.5-3):( 0.5-2) ;电镀金属以在凹陷特征中形成电镀层。还提供了具有凹陷特征的电镀层。

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