首页> 外国专利> Inorganic wafer having through-holes attached to semiconductor wafer

Inorganic wafer having through-holes attached to semiconductor wafer

机译:具有连接到半导体晶片的通孔的无机晶片

摘要

A process comprises bonding a semiconductor wafer to an inorganic wafer. The semiconductor wafer is opaque to a wavelength of light to which the inorganic wafer is transparent. After the bonding, a damage track is formed in the inorganic wafer using a laser that emits the wavelength of light. The damage track in the inorganic wafer is enlarged to form a hole through the inorganic wafer by etching. The hole terminates at an interface between the semiconductor wafer and the inorganic wafer. An article is also provided, comprising a semiconductor wafer bonded to an inorganic wafer. The semiconductor wafer is opaque to a wavelength of light to which the inorganic wafer is transparent. The inorganic wafer has a hole formed through the inorganic wafer. The hole terminates at an interface between the semiconductor wafer and the inorganic wafer.
机译:一种工艺包括将半导体晶片结合到无机晶片。半导体晶片对于无机晶片透明的光的波长是不透明的。结合之后,使用发射光波长的激光在无机晶片中形成损伤痕迹。无机晶片中的损伤轨迹被扩大以通过蚀刻形成穿过无机晶片的孔。该孔终止于半导体晶片和无机晶片之间的界面。还提供了一种制品,其包括结合到无机晶片的半导体晶片。半导体晶片对于无机晶片透明的光的波长是不透明的。无机晶片具有穿过无机晶片形成的孔。该孔终止于半导体晶片和无机晶片之间的界面。

著录项

  • 公开/公告号US10756003B2

    专利类型

  • 公开/公告日2020-08-25

    原文格式PDF

  • 申请/专利权人 CORNING INCORPORATED;

    申请/专利号US201816179048

  • 申请日2018-11-02

  • 分类号H01L23/48;H01L21/311;H01L23/498;H01L21/48;H01L23/15;B81B7;B81C1;H01L21/268;H01L21/306;H01L21/683;H01L21/762;H01L21/768;

  • 国家 US

  • 入库时间 2022-08-21 11:30:21

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