首页> 外国专利> Measuring thin films on grating and bandgap on grating

Measuring thin films on grating and bandgap on grating

机译:测量光栅上的薄膜和光栅上的带隙

摘要

Methods and systems disclosed herein can measure thin film stacks, such as film on grating and bandgap on grating in semiconductors. For example, the thin film stack may be a 1D film stack, a 2D film on grating, or a 3D film on grating. One or more effective medium dispersion models are created for the film stack. Each effective medium dispersion model can substitute for one or more layers. A thickness of one or more layers can be determined using the effective medium dispersion based scatterometry model. In an instance, three effective medium dispersion based scatterometry models are developed and used to determine thickness of three layers in a film stack.
机译:本文公开的方法和系统可以测量薄膜堆叠,例如半导体中的光栅上的膜和光栅上的带隙。例如,薄膜堆叠可以是1D薄膜堆叠,光栅上的2D薄膜或光栅上的3D薄膜。为薄膜叠层创建了一个或多个有效的介质扩散模型。每个有效的介质扩散模型都可以替代一层或多层。可以使用基于有效介质分散的散射测量模型确定一层或多层的厚度。在一个实例中,开发了三个有效的基于介质分散的散射测量模型,并将其用于确定薄膜堆叠中三层的厚度。

著录项

  • 公开/公告号US10663286B2

    专利类型

  • 公开/公告日2020-05-26

    原文格式PDF

  • 申请/专利权人 KLA-TENCOR CORPORATION;

    申请/专利号US201715800877

  • 发明设计人 HOUSSAM CHOUAIB;ZHENGQUAN TAN;

    申请日2017-11-01

  • 分类号G01B11/06;H01L21/66;H01L29/49;G01B15/02;H01L29/423;H01L29/51;H01L29/66;

  • 国家 US

  • 入库时间 2022-08-21 11:29:51

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号