首页> 外国专利> Simple approach for preparing post-treatment-free solution processed non-stoichiometric NiOx nanoparticles as conductive hole transport materials

Simple approach for preparing post-treatment-free solution processed non-stoichiometric NiOx nanoparticles as conductive hole transport materials

机译:制备无后处理溶液的非化学计量NiO x 纳米粒子作为导电空穴传输材料的简单方法

摘要

High-quality noN-stoichiometric NiOx nanoparticles are synthesized by a facile chemical precipitation method. The NiOx film can function as an effective p-type semiconductor or hole transport layer (HTL) without any post-treatments, while offering wide temperature applicability from room-temperature to 150° C. For demonstrating the potential applications, high efficiency is achieved in organic solar cells using NiOx HTL. Better performance in NiOx based organic light emitting diodes is obtained as compared to devices using PEDOT:PSS. The solution-processed NiOx semiconductors at room temperature can favor a wide-range of applications of large-area and flexible optoelectronics.
机译:通过简便的化学沉淀法合成了高质量的非氮化学计量的NiO x 纳米粒子。 NiO x 膜无需任何后处理即可充当有效的p型半导体或空穴传输层(HTL),同时提供从室温到150°C的宽温度适用性。在潜在的应用中,使用NiO x HTL在有机太阳能电池中实现了高效率。与使用PEDOT:PSS的设备相比,在基于NiO x 的有机发光二极管中获得了更好的性能。室温下固溶处理的NiO x 半导体可以促进大面积和柔性光电技术的广泛应用。

著录项

  • 公开/公告号US10604419B2

    专利类型

  • 公开/公告日2020-03-31

    原文格式PDF

  • 申请/专利权人 THE UNIVERSITY OF HONG KONG;

    申请/专利号US201916392329

  • 发明设计人 WALLACE C. H. CHOY;FEI JIANG;

    申请日2019-04-23

  • 分类号C01G53/04;H01L51/50;C01G53;H01L51/42;

  • 国家 US

  • 入库时间 2022-08-21 11:28:43

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