首页>
外国专利>
Hessian-free calculation of product of Hessian matrix and vector for lithography optimization
Hessian-free calculation of product of Hessian matrix and vector for lithography optimization
展开▼
机译:用于光刻优化的Hessian矩阵与矢量的乘积的无Hessian计算
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method for optimizing a binary mask pattern includes determining, by a processor, an evaluation value based on a comparison between a design pattern and a substrate pattern simulated based on the binary mask pattern. The method also includes, based on the evaluation value, using, by the processor, a gradient-based optimization method to generate a first adjusted binary mask pattern. The method also includes determining, by the processor, a first updated evaluation value based on a comparison between the design pattern and a first updated substrate pattern simulated based on the first adjusted binary mask pattern. The method also includes, based on the first updated evaluation value, using, by the processor, a product of a Hessian matrix and an arbitrary vector to generate a second adjusted binary mask pattern. The method also includes simulating, by the processor, a second updated substrate pattern based on the second adjusted binary mask pattern.
展开▼