首页> 外国专利> System and method for an interferometer resistant to externally applied forces

System and method for an interferometer resistant to externally applied forces

机译:抵抗外部施加力的干涉仪的系统和方法

摘要

An embodiment of a ruggedized interferometer is described that comprises a light source that generates a beam of light; a fixed mirror; a moving mirror that travels along a linear path; a beam splitter that directs a first portion of the beam of light to the fixed mirror and a second portion of the beam of light to the moving mirror, wherein the beam splitter recombines the first portion reflected from the fixed mirror and the second portion reflected from the moving mirror; and a servo control that applies a substantial degree of force to the moving mirror at initiation of a turnaround period, wherein the substantial degree of force is sufficient to redirect the moving mirror traveling at a high velocity to an opposite direction of travel on the linear path.
机译:描述了一种加固型干涉仪的实施例,其包括产生光束的光源;以及用于产生光束的光源。固定镜子沿直线路径移动的移动镜;分束器,将光束的第一部分引导到固定镜,将光束的第二部分引导到移动镜,其中分束器将固定镜反射的第一部分和反射镜反射的第二部分重新组合动镜;以及伺服控制装置,该伺服控制装置在周转周期开始时向移动镜施加很大的力,其中,足够大的力足以将高速移动的移动镜重定向到线性路径上相反的行进方向。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号