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Layer class relative density for technology modeling in IC technology
Layer class relative density for technology modeling in IC technology
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机译:IC技术中用于技术建模的层级相对密度
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摘要
A method and apparatus of a novel modeling scheme for performing optical lithography simulation for a multi-color layer fabrication process is described. The method interpolates for simulation use between test or experimental data or descriptions to more accurately apply color differentiated parameters to the model creation and lithography simulation.
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