首页>
外国专利>
Cleaning solution and cleaning method for material comprising carbon-incorporated silicon oxide for use in recycling wafer
Cleaning solution and cleaning method for material comprising carbon-incorporated silicon oxide for use in recycling wafer
展开▼
机译:用于回收晶片的包含碳结合的氧化硅的材料的清洗液和清洗方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
It is an object of the present invention to provide a cleaning solution for removing carbon-incorporated silicon oxide (SiOC) from the surface of a wafer in a step of producing a wafer having a material comprising the SiOC, and a cleaning method of using the same. The cleaning solution of the present invention comprises 2% by mass to 30% by mass of a fluorine compound, 0.0001% by mass to 20% by mass of a specific cationic surfactant that is an ammonium salt or an amine, and water, and has a pH value of 0 to 4.
展开▼