首页> 外国专利> METHOD FOR PRODUCING A 3D STRUCTURE BY MEANS OF LASER LITHOGRAPHY, AND CORRESPONDING COMPUTER PROGRAM PRODUCT

METHOD FOR PRODUCING A 3D STRUCTURE BY MEANS OF LASER LITHOGRAPHY, AND CORRESPONDING COMPUTER PROGRAM PRODUCT

机译:激光光刻技术制作3D结构的方法及相应的计算机程序产品

摘要

A system, computer program product and method for producing a three-dimensional overall structure by means of laser lithography, the overall structure being approximated by at least one partial structure, wherein, for the purposes of writing the partial structure, an exposure dose is radiated into the lithography material in a focal region of a laser writing beam while exploiting multi-photon absorption. Here, in the partial structure, the exposure dose in those edge portions that immediately adjoin an external surface of the overall structure to be produced is modified in comparison with the remaining partial structure.
机译:一种用于通过激光光刻制造三维整体结构的系统,计算机程序产品和方法,该整体结构由至少一个局部结构近似,其中,为了写入局部结构,辐射曝光剂量在利用多光子吸收的同时,在激光写入光束的焦点区域中将光刻材料注入光刻材料中。在此,在局部结构中,与其余的局部结构相比,改变了在紧邻要制造的整体结构的外表面的那些边缘部分中的曝光剂量。

著录项

  • 公开/公告号US2020047408A1

    专利类型

  • 公开/公告日2020-02-13

    原文格式PDF

  • 申请/专利权人 NANOSCRIBE GMBH;

    申请/专利号US201816604286

  • 发明设计人 YANN TANGUY;NICOLE LINDENMANN;

    申请日2018-02-07

  • 分类号B29C64/135;B33Y10;B33Y50;B29C64/386;G03F7/20;

  • 国家 US

  • 入库时间 2022-08-21 11:24:45

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