(M2+)1-X(M3+)X(OH)2(An−)X/n.mH2O  (1),wherein M2+ indicates a divalent metal, M3+ indicates a trivalent metal, An− indicates an n-valent anion, n indicates an integer of 1 to 6, 0.17≤x≤0.36, and 0≤m≤10. The hydrotalcite has(A) a lattice strain in the 003 direction is 3×10−3 or less as measured using an X-ray diffraction method;(B) primary particles with an average width between 5 nm and 200 nm inclusive per a SEM method; and(C) a degree of monodispersity of 50% or greater (degree of monodispersity (%)=(average width of primary particles as measured using the SEM method/average width of secondary particles as measured using a dynamic light scattering method)×100). A resin containing the hydrotalcite, a suspension containing the hydrotalcite and a method for producing the hydrotalcite are disclosed."/> MICROPARTICULATE HYDROTALCITE, METHOD FOR PRODUCING SAME, RESIN COMPOSITION OF SAME, AND SUSPENSION OF SAME
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MICROPARTICULATE HYDROTALCITE, METHOD FOR PRODUCING SAME, RESIN COMPOSITION OF SAME, AND SUSPENSION OF SAME

机译:微颗粒水滑石,其制备方法,其树脂组成和相同的悬浮液

摘要

A hydrotalcite is represented by formula (1):; (M2+)1-X(M3+)X(OH)2(An−)X/n.mH2O  (1),wherein M2+ indicates a divalent metal, M3+ indicates a trivalent metal, An− indicates an n-valent anion, n indicates an integer of 1 to 6, 0.17≤x≤0.36, and 0≤m≤10. The hydrotalcite has(A) a lattice strain in the 003 direction is 3×10−3 or less as measured using an X-ray diffraction method;(B) primary particles with an average width between 5 nm and 200 nm inclusive per a SEM method; and(C) a degree of monodispersity of 50% or greater (degree of monodispersity (%)=(average width of primary particles as measured using the SEM method/average width of secondary particles as measured using a dynamic light scattering method)×100). A resin containing the hydrotalcite, a suspension containing the hydrotalcite and a method for producing the hydrotalcite are disclosed.
机译:水滑石由式(1)表示: <?in-line-formulae description =“ In-line Formulae” end =“ lead”?>(M 2 + 1-X (M 3 + X (OH) 2 (A n&#x2212; X / n < I> .m H 2 O&#x2003;&#x2003;(1),<?in-line-formulae description =“ In-line Formulae” end =“ tail”? > 其中M 2 + 表示二价金属,M 3 + 表示三价金属,A n&#x2212; 表示一个n价阴离子,n表示1到6的整数,0.17&#x2264; x&#x2264; 0.36,和0#x2264; m&#x2264; 10。水滑石的 (A)在<003>方向上的晶格应变为3×10 &#x2212; 3 X射线衍射法测得的值;或更低; (B)每个SEM的平均宽度在5 nm至200 nm之间的初级粒子方法;和 (C),单分散度为50%或更高(单分散度(%)=(使用SEM方法/使用动态光散射方法测得的次级粒子的平均宽度×100)。公开了含有水滑石的树脂,含有水滑石的悬浮液和生产水滑石的方法。

著录项

  • 公开/公告号US2020017365A1

    专利类型

  • 公开/公告日2020-01-16

    原文格式PDF

  • 申请/专利权人 KYOWA CHEMICAL INDUSTRY CO. LTD.;

    申请/专利号US201816494657

  • 发明设计人 KOTARO MORI;SHIGEO MIYATA;

    申请日2018-03-15

  • 分类号C01F7;C08K3/26;C08K9/02;C08K9/06;C08L27/06;

  • 国家 US

  • 入库时间 2022-08-21 11:23:49

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