首页> 外国专利> PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON-BASED COATINGS ON SURFACES

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON-BASED COATINGS ON SURFACES

机译:表面上碳基涂层的等离子体增强化学气相沉积

摘要

Systems and methods for producing carbon-based coatings featuring diamond-like carbon (DLC) structures on the internal surfaces of cylindrical or tube-like components is disclosed. The methods feature the use of plasma-enhanced chemical vapor deposition (PECVD) to provide a generally uniform coating on the surface. Longitudinally homogeneous plasma is ignited directly inside the tube-like component. A bipolar pulse with a reverse active plasma step is used. The pressure and bias voltage are selected so as to cause the deposition of a carbon-based coating on the inner surface.
机译:公开了用于生产在圆柱形或管状部件的内表面上具有类金刚石碳(DLC)结构的碳基涂层的系统和方法。该方法的特征在于使用等离子体增强化学气相沉积(PECVD)以在表面上提供通常均匀的涂层。纵向均匀的等离子体直接在管状部件内部点燃。使用具有反向有源等离子体步长的双极性脉冲。选择压力和偏置电压,以引起碳基涂层在内表面上的沉积。

著录项

  • 公开/公告号US2020017960A1

    专利类型

  • 公开/公告日2020-01-16

    原文格式PDF

  • 申请/专利权人 DURALAR TECHNOLOGIES LLC;

    申请/专利号US201716316004

  • 发明设计人 ANDREW TUDHOPE;SALVATORE GENNARO;

    申请日2017-07-05

  • 分类号C23C16/04;C23C16/02;C23C16/27;C23C16/515;H05H1/46;

  • 国家 US

  • 入库时间 2022-08-21 11:23:40

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