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MIRROR FOR EXTREME ULTRAVIOLET LIGHT AND EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS

机译：极紫外光和极紫外光产生装置的反射镜

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摘要

A mirror for extreme ultraviolet light includes: a substrate (41); a multilayer film (42) provided on the substrate and configured to reflect extreme ultraviolet light; and a capping layer (53) provided on the multilayer film, and the capping layer includes a first layer (61) containing an oxide of a metal, and a second layer (62) arranged between the first layer and the multilayer film and containing at least one of a boride of the metal and a nitride of the metal.

机译：用于极紫外光的镜子包括：基板（ 41 ）;多层膜（ 42 ）设置在基板上并构造成反射极紫外光;盖层（ 53 ）设置在多层膜上，该盖层包括含有金属氧化物的第一层（ 61 ）和第二层（ 53 ）。 62 ）设置在第一层和多层膜之间，并包含金属的硼化物和金属的氮化物中的至少一种。 展开▼

著录项

公开/公告号US2020209444A1

专利类型

公开/公告日2020-07-02

原文格式PDF

申请/专利权人 GIGAPHOTON INC.;
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申请/专利号US202016814384

发明设计人 OSAMU WAKABAYASHI;YOSHIYUKI HONDA;
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申请日2020-03-10

分类号G02B5/08;G03F1/24;G03F1/52;G03F1/58;

国家 US

入库时间 2022-08-21 11:22:10

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