Estimating Amplitude and Phase Asymmetry in Imaging Technology for Achieving High Accuracy in Overlay Metrology

摘要

A design of a diffraction limited, microscope objective with a curved image plane is presented. The described microscope objective is used with a two-degree-of-freedom galvanometer scanning system including two galvo mirrors with a relay step between the mirrors to enable scanning in both directions over the full, curved field for creating custom refractive structures across the 6.5 mm optical zone of contact lenses using femtosecond micro-modification.