首页> 外国专利> Maintaining Coercive Field after High Temperature Anneal for Magnetic Device Applications with Perpendicular Magnetic Anisotropy

Maintaining Coercive Field after High Temperature Anneal for Magnetic Device Applications with Perpendicular Magnetic Anisotropy

机译:具有垂直磁各向异性的磁性设备应用中高温退火后的矫顽场

摘要

A magnetic tunnel junction with perpendicular magnetic anisotropy (PMA MTJ) is disclosed wherein a free layer interfaces with a tunnel barrier and has a second interface with an oxide layer. A lattice-matching layer adjoins an opposite side of the oxide layer with respect to the free layer and is comprised of CoXFeYNiZLWMV or an oxide or nitride of Ru, Ta, Ti, or Si, wherein L is one of B, Zr, Nb, Hf, Mo, Cu, Cr, Mg, Ta, Ti, Au, Ag, or P, and M is one of Mo, Mg, Ta, Cr, W, or V, (x+y+z+w+v)=100 atomic %, x+y0, and each of v and w are 0. The lattice-matching layer grows a BCC structure during annealing thereby promoting BCC structure growth in the oxide layer that results in enhanced free layer PMA and improved thermal stability.
机译:公开了具有垂直磁各向异性的磁性隧道结(PMA MTJ),其中,自由层与隧道势垒相接,而第二层与氧化物层相接。晶格匹配层相对于自由层邻接氧化物层的相对侧,并且由Co X Fe Y Ni Z 组成L W M V 或Ru,Ta,Ti或Si的氧化物或氮化物,其中L是B,Zr,Nb,Hf,Mo,Cu, Cr,Mg,Ta,Ti,Au,Ag或P,M是Mo,Mg,Ta,Cr,W或V中的一种,(x + y + z + w + v)= 100原子%,x + y> 0,且v和w均大于0。晶格匹配层在退火期间生长BCC结构,从而促进氧化物层中的BCC结构生长,这导致增强的自由层PMA和改善的热稳定性。

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