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Cu ALLOY CORE BONDING WIRE WITH Pd COATING FOR SEMICONDUCTOR DEVICE

机译:用于半导体器件的带Pd涂层的铜合金芯焊接线

摘要

A bonding wire for a semiconductor device includes a Cu alloy core material and a Pd coating layer formed on a surface thereof, and the boding wire contains one or more elements of As, Te, Sn, Sb, Bi and Se in a total amount of 0.1 to 100 ppm by mass. The bonding longevity of a ball bonded part can increase in a high-temperature and high-humidity environment, improving the bonding reliability. When the Cu alloy core material further contains one or more of Ni, Zn, Rh, In, Ir, Pt, Ga and Ge in an amount, for each, of 0.011 to 1.2% by mass, it is able to increase the reliability of a ball bonded part in a high-temperature environment of 170° C. or more. When an alloy skin layer containing Au and Pd is further formed on a surface of the Pd coating layer, wedge bondability improves.
机译:用于半导体器件的键合线包括Cu合金芯材料和在其表面上形成的Pd涂层,并且键合线包含As,Te,Sn,Sb,Bi和Se的总量中的一种或多种元素。 0.1至100质量ppm。球结合部的结合寿命在高温高湿环境下可以提高,从而提高结合可靠性。当Cu合金芯材料进一步包含各自为0.011至1.2质量%的量的Ni,Zn,Rh,In,Ir,Pt,Ga和Ge中的一种或多种时,能够提高合金的可靠性。 170℃以上的高温环境下的球形接合部。当在Pd涂层的表面上进一步形成包含Au和Pd的合金表皮层时,楔结合性提高。

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