PLASMA CORRIDOR FOR HIGH VOLUME PE-CVD PROCESSING

摘要

A coating system includes a coating chamber having a peripheral chamber wall,a top wall,and a bottom wall. The peripheral chamber wall defines a chamber center. Aplasma source ispositioned at the chamber center. The coating system also includes a sampleholder that holds aplurality of substrates to be coated which is rotatable about the chambercenter at a first distance fromthe chamber center. A first isolation shield is positioned about the chambercenter at a second distancefrom the chamber center, the first isolation shield being negatively charged.