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METHOD FOR PURIFYING WASTE SOLUTION OF THINNER AND THINNER COMPOSITION OBTAINED THEREFROM

机译:纯化稀浆和由此获得的稀浆组合物的废液的方法

摘要

The present invention relates to a method for purifying a waste solution of a thinner and, more specifically, to a method for purifying a waste solution of thinner, by which a waste solution of a thinner used in a rinse process for cleaning a photoresist in a semiconductor fabrication process can be used in a rinse process of a display manufacturing process. Without adding a specific compound or using specific equipment other than for distillation in order to remove impurities, a purified product can be immediately used as a thinner composition without the addition of a specific ingredient, and thus economic efficiency can be improved.
机译:稀释剂废液的提纯方法本发明涉及一种稀释剂废液的提纯方法,更具体地说,涉及一种稀释剂的提纯方法,通过该稀释剂在冲洗过程中使用的稀释剂废液用于清洁涂料中的光刻胶。半导体制造工艺可以用于显示器制造工艺的冲洗工艺中。在不添加特定化合物或不使用蒸馏以外的特定设备的情况下,为了去除杂质,可以不添加特定成分而将精制产物直接用作稀释剂,因此可以提高经济效率。

著录项

  • 公开/公告号WO2020017779A1

    专利类型

  • 公开/公告日2020-01-23

    原文格式PDF

  • 申请/专利权人 DUKSAN CO.LTD;

    申请/专利号WO2019KR07786

  • 发明设计人 LEE WOO YONG;LEE SEUNG YOUNG;

    申请日2019-06-27

  • 分类号G03F7/30;C02F1/04;G03F1/82;H01L21/02;G03F7/42;C11D11;C11D7/26;

  • 国家 WO

  • 入库时间 2022-08-21 11:13:45

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