首页> 外国专利> SOLUTION-BASED DEPOSITION METHOD FOR PREPARING SEMICONDUCTING THIN FILMS VIA DISPERSED PARTICLE SELF-ASSEMBLY AT A LIQUID-LIQUID INTERFACE

SOLUTION-BASED DEPOSITION METHOD FOR PREPARING SEMICONDUCTING THIN FILMS VIA DISPERSED PARTICLE SELF-ASSEMBLY AT A LIQUID-LIQUID INTERFACE

机译:基于溶液界面的分散颗粒自组装半导电薄膜制备的基于溶液的沉积方法

摘要

The present invention relates to a method for preparing a semiconducting thin film comprising the steps of (1) providing a liquid-liquid interface; (2) providing at least one layered semiconductor material or its precursor(s) in the form of particles in a solvent in the form of a dispersion; (3) injecting the dispersion at the liquid-liquid interface, in order to obtain an assembly of semiconductor/semiconductor precursor particles; (4) bringing the assembly of into contact with a flexible substrate; and (5) applying a surface pressure to the dispersion to obtain a particle film of semiconductor/semiconductor precursor on the substrate, wherein the first solvent has a higher density than the second solvent. The present invention also relates to a device for carrying out the method.
机译:本发明涉及一种制备半导体薄膜的方法,该方法包括以下步骤:(1)提供液-液界面; (2)以分散体的形式在溶剂中提供至少一种颗粒状的层状半导体材料或其前体。 (3)在液-液界面处注入分散液,以获得半导体/半导体前驱体颗粒的组装体; (4)使组件与柔性基板接触; (5)对分散液施加表面压力,以在基板上获得半导体/半导体前驱体的粒子膜,其中第一溶剂的密度高于第二溶剂的密度。本发明还涉及用于执行该方法的设备。

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