首页>
外国专利>
SOLUTION-BASED DEPOSITION METHOD FOR PREPARING SEMICONDUCTING THIN FILMS VIA DISPERSED PARTICLE SELF-ASSEMBLY AT A LIQUID-LIQUID INTERFACE
SOLUTION-BASED DEPOSITION METHOD FOR PREPARING SEMICONDUCTING THIN FILMS VIA DISPERSED PARTICLE SELF-ASSEMBLY AT A LIQUID-LIQUID INTERFACE
展开▼
机译:基于溶液界面的分散颗粒自组装半导电薄膜制备的基于溶液的沉积方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention relates to a method for preparing a semiconducting thin film comprising the steps of (1) providing a liquid-liquid interface; (2) providing at least one layered semiconductor material or its precursor(s) in the form of particles in a solvent in the form of a dispersion; (3) injecting the dispersion at the liquid-liquid interface, in order to obtain an assembly of semiconductor/semiconductor precursor particles; (4) bringing the assembly of into contact with a flexible substrate; and (5) applying a surface pressure to the dispersion to obtain a particle film of semiconductor/semiconductor precursor on the substrate, wherein the first solvent has a higher density than the second solvent. The present invention also relates to a device for carrying out the method.
展开▼