CHARGED PARTICLE BEAM DEVICE, FIELD CURVATURE CORRECTOR, AND METHODS OF OPERATING A CHARGED PARTICLE BEAM DEVICE

摘要

A charged particle beam device (100) is described, which includes: a beam source (105) configured to generate a charged particle beam (101) propagating along an optical axis (A); an aperture device (110) with a plurality of apertures configured to create a plurality of beamlets (102) from the charged particle beam; and a field curvature corrector (120). The field curvature corrector (120) includes: a first multi-aperture electrode (121) with a first plurality of openings having diameters that vary as a function of a distance from the optical axis (A); a second multi-aperture electrode (122) with a second plurality of openings; and an adjustment device (132) configured to adjust at least one of a first electrical potential (U1) of the first multi-aperture electrode (121) and a second electrical potential (U2) of the second multi-aperture electrode (122). Further, a field curvature corrector (120) and methods of operating a charged particle beam device are described.