A magnetized plasmoid injection device (10) which enables the precise control of the amount of impurities, and which is provided with: a cylindrical external electrode (11); an internal electrode (12) which is coaxially arranged within the external electrode; a plasma generating gas supply unit (13) which supplies a plasma generating gas in a pulse state between the external electrode and the internal electrode; a magnetic field generation unit (15) which applies a magnetic field that generates a magnetized plasmoid between the external electrode and the internal electrode; a power supply control unit (14) which applies a discharge voltage between the external electrode and the internal electrode; and an impurity generation unit (100) which has the magnetized plasmoid contain impurities. The impurity generation unit comprises: a cover electrode (102) which opens to the external electrode; a needle-like electrode (101) which is positioned within the cover electrode, while being composed of impurities; and an impurity generating power supply which applies a voltage to the cover electrode and the needle-like electrode.
展开▼
